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Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology

著者名:
Lee, B. ( Toppan Chunghwa Electronics Corp. (Taiwan, China) )
Hung, R. ( Nanya Technology Corp. (Taiwan) )
Lin, O. ( Toppan Chunghwa Electronics Corp. (Taiwan, China) )
Wu, Y.-H. ( Nanya Technology Corp. (Taiwan, China) )
Kozuma, M. ( Toppan Chunghwa Electronics Corp. (Taiwan, China) )
Shih, C.-L. ( Nanya Technology Corp. (Taiwan, China) )
Hsu, M. ( ASML MaskTools, Inc. (USA) )
Hsu, S. D. ( ASML MaskTools, Inc. (USA) )
さらに 3 件
掲載資料名:
Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5645
発行年:
2004
開始ページ:
114
終了ページ:
121
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456007 [0819456004]
言語:
英語
請求記号:
P63600/5645
資料種別:
国際会議録

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