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Self-assembled ultralow-k porous silica films for 45-nm node technology (Invited Paper)

著者名:
Kikkawa, T. ( Hiroshima Univ. (Japan) and National Institute of Advanced Industrial Science and Technology (Japan) )
Oku, Y. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Kohmura, K. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Fujii, N. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Tanaka, H. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Ishikawa, A. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Matsuo, H. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Sonoda, Y. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Miyoshi, H. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Goto, T. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Hata, N. ( National Institute of Advanced Industrial Science and Technology (Japan) )
Seino, Y. ( National Institute of Advanced Industrial Science and Technology (Japan) )
Takada, S. ( National Institute of Advanced Industrial Science and Technology (Japan) )
Yoshino, T. ( National Institute of Advanced Industrial Science and Technology (Japan) )
Kinoshita, K. ( Association of Super-Advanced Electronics Technolgies (Japan) )
さらに 10 件
掲載資料名:
Nanofabrication: Technologies, Devices, and Applications
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5592
発行年:
2005
開始ページ:
153
終了ページ:
157
総ページ数:
5
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455451 [0819455458]
言語:
英語
請求記号:
P63600/5592
資料種別:
国際会議録

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