Advanced photomask repair technology for 65-nm lithography: II
- 著者名:
Itou, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Tanaka, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Sugiyama, Y. ( SII NanoTechnology Inc. (Japan) ) Hagiwara, R. ( SII NanoTechnology Inc. (Japan) ) Takahashi, H. ( SII NanoTechnology Inc. (Japan) ) Takaoka, O. ( SII NanoTechnology Inc. (Japan) ) Kozakai, T. ( SII NanoTechnology Inc. (Japan) ) Matsuda, O. ( SII NanoTechnology Inc. (Japan) ) Suzuki, K. ( SII NanoTechnology Inc. (Japan) ) Okabe, M. ( SII NanoTechnology Inc. (Japan) ) Kikuchi, S. ( SII NanoTechnology Inc. (Japan) ) Uemoto, A. ( SII NanoTechnology Inc. (Japan) ) Yasaka, A. ( SII NanoTechnology Inc. (Japan) ) Adachi, T. ( SII NanoTechnology Inc. (Japan) ) Nishida, N. ( HOYA Corp. (Japan) ) Ozawa, T. ( HOYA Corp. (Japan) ) - 掲載資料名:
- 24th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5567
- 発行年:
- 2004
- 開始ページ:
- 1132
- 終了ページ:
- 1143
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- 言語:
- 英語
- 請求記号:
- P63600/5567-2
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |