Blank Cover Image

Evaluation of printability of crystal growth defects in a 193-nm lithography environment using AIMS

著者名:
掲載資料名:
24th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5567
発行年:
2004
開始ページ:
1035
終了ページ:
1043
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
言語:
英語
請求記号:
P63600/5567-2
資料種別:
国際会議録

類似資料:

1 国際会議録 Application results at 193nm: lithography emulation by aerial imaging and supplementary high resolution measurements

Zibold, A. M., Schmid, R., Bohm, K., Brunner, R., Durr, A. C.

SPIE - The International Society of Optical Engineering
7 国際会議録 ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

Chen,J.X., Riddick,J., Lamantia,M., Zerrade,A., Henderson,P.K., Hughes,G.P., Tabery,C.E., Phan,K.A., Spence,C.A., …

SPIE-The International Society for Optical Engineering
2 国際会議録 Printability of hard and soft defects in 193-nm lithography

Philipsen, V., Jonckheere, R.M., Kohlpoth S., Friedrich, C.M., Torres, J.A.

SPIE-The International Society for Optical Engineering
8 国際会議録 Advances with the new AIMS fab 193 2nd generation: a system for the 65 nm node including immersion [5853-131]

Zibold, A. M., Poortinga, E., Doornmalen, H. v., Schmid, R., Scherubl, T., Harnisch, W.

SPIE - The International Society of Optical Engineering
3 国際会議録 Aerial image measurement technique for fast evaluation of 193-nm lithography masks

Zibold, A.M., Scheruebl, T., Harnisch, W., Brunner, R., Greif, J.

SPIE - The International Society of Optical Engineering
9 国際会議録 Aerial image measuring system at 193 nm: a tool-to-tool comparison and global CD mapping

Zibold, A. M., Schmid, R., Bohm, K., Birkner, R.

SPIE - The International Society of Optical Engineering
4 国際会議録 Defect printability for 100-nm design rule using 193-nm lithography

Philipsen, V., Jonckheere, R.M., Kohlpoth, S., Torres, A.

SPIE-The International Society for Optical Engineering
10 国際会議録 Printability study with polarization based AIMS fab 193i to investigate mask polarization effects [6281-11]

Zibold, A., Stroessner, U., Poortinga, E., Schmid, R., Scherubl, T, Rosenkranz, N., Harnisch, W.

SPIE - The International Society of Optical Engineering
5 国際会議録 Printability study with polarisation capable AIMS fab 193i to study polarisation effects [6152-92]

Zibold, A., Stroessner, U., Ridley, A., Scherubl, T., Rosenkranz, N., Harnisch, W., Poortinga, E., Schmid, R., Bekaert, …

SPIE - The International Society of Optical Engineering
11 国際会議録 Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET

Shieh, W.B., Chou, W., Yang, C.-H., Wu, J.K., Chen, N., Yen, S.M., Hsu, T., Tuan, S., Chang, D., Rudzinski, M.W., Wang, …

SPIE - The International Society of Optical Engineering
6 国際会議録 Printability impact of progressive defects: ammonium sulfate emulation study

B. Grenon, T. Huang, A. Dayal, K. Bhattacharyya

Society of Photo-optical Instrumentation Engineers
12 国際会議録 Extended defect printability study for 100-nm design rule using 193-nm lithography

Philipsen, V., Jonckheere, R.M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12