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Contact and via hole mask design optimization for 65-nm technology node

著者名:
Van Den Broeke, D. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )
Shi, X. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )
Socha, R. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )
Laidig, T. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )
Hollerbach, U. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )
Wampler, K. E. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )
Hsu, S. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )
Chen, J. F. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )
Corcoran, N. P. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )
Dusa, M. V. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )
Park, J. C. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )
さらに 6 件
掲載資料名:
24th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5567
発行年:
2004
開始ページ:
680
終了ページ:
690
総ページ数:
11
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
言語:
英語
請求記号:
P63600/5567-1
資料種別:
国際会議録

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