Contact and via hole mask design optimization for 65-nm technology node

Contact and via hole mask design optimization for 65-nm technology node

著者名:

Van Den Broeke, D. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Shi, X. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Socha, R. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Laidig, T. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Hollerbach, U. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Wampler, K. E. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Hsu, S. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Chen, J. F. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Corcoran, N. P. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Dusa, M. V. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Park, J. C. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

さらに 6 件

掲載資料名:

24th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5567

発行年:

2004

開始ページ:

680

終了ページ:

690

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

言語:

英語

請求記号:

P63600/5567-1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014769
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2004 : 24th
会議開催地:	Monterey, California, USA
会議開催年:	2004.09.14-2004.09.17

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2 国際会議録 Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node Van Den Broeke, D.J., Laidig, T.L., Chen, J.F., Wampler, K.E., Hsu, S.D., Shi, X., Socha, R.J., Dusa, M.V., Corcoran, … SPIE - The International Society of Optical Engineering	8 国際会議録 Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask Chen, J.F., Van Den Broeke, D.J., Hsu, M., Laidig, T.L., Wampler, K.E., Shi, X., Hsu, S., Shafer, T. SPIE-The International Society for Optical Engineering
3 国際会議録 Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering	9 国際会議録 Implementation of random contact hole design with CPL mask by using IML technology [5992-108] Hsu, M., Van Den Broeke, D., Hsu, S., Chen, J. F., Shi, X., Corcoran, N., Yu, L. SPIE - The International Society of Optical Engineering
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