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Mask topography effect in chromeless phase lithography

著者名:
Philipsen, V. ( IMEC vzw (Belgium) )
Bekaert, J. ( IMEC vzw (Belgium) )
Vandenberghe, G. ( IMEC vzw (Belgium) )
Jonckheere, R. ( IMEC vzw (Belgium) )
Van Den Broeke, D. ( ASML MaskTools, Inc. (USA) )
Socha, R. ( ASML Technology Development Ctr. (USA) )
さらに 1 件
掲載資料名:
24th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5567
発行年:
2004
開始ページ:
669
終了ページ:
679
総ページ数:
11
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
言語:
英語
請求記号:
P63600/5567-1
資料種別:
国際会議録

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