Resist model calibration using 2D developed patterns for low-k1 process optimization and wafer printing predictions
- 著者名:
Chen, T. ( ASML MaskTools, Inc. (USA) ) Van Den Broeke, D. ( ASML MaskTools, Inc. (USA) ) Park, S. ( ASML MaskTools, Inc. (USA) ) Liebchen, A. ( ASML MaskTools, Inc. (USA) ) Chen, J. F. ( ASML MaskTools, Inc. (USA) ) Hsu, S. ( ASML MaskTools, Inc. (USA) ) Park, J. C. ( ASML MaskTools, Inc. (USA) ) Yu, L. ( ASML MaskTools, Inc. (USA) ) Gronlund, K. ( ASML MaskTools, Inc. (USA) ) - 掲載資料名:
- 24th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5567
- 発行年:
- 2004
- 開始ページ:
- 434
- 終了ページ:
- 444
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- 言語:
- 英語
- 請求記号:
- P63600/5567-1
- 資料種別:
- 国際会議録
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