Quantitative analysis of develop loading effect and its application
- 著者名:
Han, H. -S. ( Samsung Electronics Co., Ltd. (South Korea) ) Moon, S. -G. ( Samsung Electronics Co., Ltd. (South Korea) ) Yoon, J. -B. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, B. -G. ( Samsung Electronics Co., Ltd. (South Korea) ) Moon, S. -Y. ( Samsung Electronics Co., Ltd. (South Korea) ) Choi, S. -W. ( Samsung Electronics Co., Ltd. (South Korea) ) Han, W. -S. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- 24th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5567
- 発行年:
- 2004
- 開始ページ:
- 213
- 終了ページ:
- 219
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- 言語:
- 英語
- 請求記号:
- P63600/5567-1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Resolution improvement of chemical-amplification resist using process-induced effect correction
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |