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A fast optical scanning deflectometer for measuring the topography of large silicon wafers

著者名:
Krey, S. ( Trioptics GmbH (Germany) )
van Amstel, W. D. ( Philips OFT(Netherlands) )
Szwedowicz, K. ( Philips OFT(Netherlands) )
Campos, J. ( Univ. Autonoma de Barcelona (Spain) )
Mareno, A. ( Univ. Autonoma de Barcelona (Spain) )
Lous, E. J. ( Philips Semiconductors B,V. (Netherlands) )
さらに 1 件
掲載資料名:
Current developments in lens design and optical engineering V : 4-5 August 2004, Denver, Colorado, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5523
発行年:
2004
開始ページ:
110
終了ページ:
120
総ページ数:
11
出版情報:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819454614 [0819454613]
言語:
英語
請求記号:
P63600/5523
資料種別:
国際会議録

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