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Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation

著者名:
Pforr, R. ( Infineon Technologies AG(Germany) )
Dettmann, W. ( Infineon Technologies AG(Germany) )
Eisenhut, M. ( Infineon Technologies AG(Germany) )
Hennig, M. ( Infineon Technologies AG(Germany) )
Hofmann, D. ( Infineon Technologies AG(Germany) )
Thiele, J. ( Infineon Technologies AG(Germany) )
Thielscher, G. ( Infineon Technologies AG(Germany) )
さらに 2 件
掲載資料名:
20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5504
発行年:
2004
開始ページ:
178
終了ページ:
187
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819454379 [0819454370]
言語:
英語
請求記号:
P63600/5504
資料種別:
国際会議録

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