Proposal for a distributed parallel system for high-throughput maskless e-beam lithography(Invited Paper)

Proposal for a distributed parallel system for high-throughput maskless e-beam lithography(Invited Paper)

著者名:

Groves, T. R. ( Leica Microsystems GmbH(Germany) )
Pickard, D. S. ( Stanford Univ. (USA) )

掲載資料名:

20th European Conference on Mask Technology for Integrated Circuits and Microcomponents

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5504

発行年:

2004

開始ページ:

173

終了ページ:

177

総ページ数:

5

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819454379 [0819454370]

言語:

英語

請求記号:

P63600/5504

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014705
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
回次:	2004 : 20th
会議開催地:	Dresden, Germany
会議開催年:	2004.01.12-2004.01.14

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