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Noise modeling and performance in 0.1 5-μm fully depleted SOI MOSFET

著者名:
Pailloncy, G. ( Institut d'Electronique de Microelectronique et de Nanotechnologie (France) )
Ihiguez, B. ( Univ. Rovird i Virgili (Spain) )
Dambrine, G. ( Institut d'Electronique de Microelectronique et de Nanotechnologie (France) )
Dehan, M. ( Univ. Catholique de Louvain (Belgium) )
Raskin, J.-P. ( Univ. Catholique de Louvain (Belgium) )
Matsuhashi, H. ( Oki Elecfric Industry Co., Ltd. (Japan) )
Delatte, P. ( CISSOID (Belgium) )
Danneville, F. ( Institut d'Electronique de Microelectronique et de Nanotechnologie (France) )
さらに 3 件
掲載資料名:
Noise in devices and circuits II : 26-28 May 2004, Maspalomas, Gran Canaria, Spain
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5470
発行年:
2004
開始ページ:
122
終了ページ:
130
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453969 [081945396X]
言語:
英語
請求記号:
P63600/5470
資料種別:
国際会議録

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