Fabrication of diffractive optical elements with grayscale photo-lithography
- 著者名:
Kim, W. -C. ( Yonsei Univ (South Korea) ) Lee, M. ( Samsung Advanced Institute of Technology (South Korea) ) Sohn, J. ( Samsung Advanced Institute of Technology (South Korea) ) Cho, E. ( Samsung Advanced Institute of Technology (South Korea) ) Yoon, C. ( Yonsei Univ. (South Korea) ) Park, N. ( Yonsei Univ. (South Korea) ) Park, Y. ( Yonsei Univ. (South Korea) ) - 掲載資料名:
- Optical data storage 2004 : 18-21 April 2004, Monterey, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5380
- 発行年:
- 2004
- 開始ページ:
- 686
- 終了ページ:
- 696
- 総ページ数:
- 11
- 出版情報:
- Bellingham: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452931 [0819452939]
- 言語:
- 英語
- 請求記号:
- P63600/5380
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
11
国際会議録
Patterning with spacer for expanding the resolution limit of current lithography tool [6156-27]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |