Inspection and printability of programmed defects on reticles for 0.200- and 0.175-μm rule devices
- 著者名:
Yamaguchi, S. ( Toshiba Corp. (Japan) ) Kanai, H. ( Toshiba Corp. (Japan) ) Komano, H. ( Toshiba Corp. (Japan) ) Sakurai, H. ( Toshiba Corp. (Japan) ) Kondo, T. ( Toshiba Corp. (Japan) ) Itoh, M. ( Toshiba Corp. (Japan) ) Mori, I. ( Toshiba Corp. (Japan) ) Higashikawa, I. ( Toshiba Corp. (Japan) ) - 掲載資料名:
- Photomask and X-Ray Mask Technology VI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3748
- 発行年:
- 1999
- 開始ページ:
- 546
- 終了ページ:
- 556
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432308 [081943230X]
- 言語:
- 英語
- 請求記号:
- P63600/3748
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
7
国際会議録
Defect printability analysis on electron projection lithography with diamond stencil reticle
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |