Evaluation of the impact of pattern fidelity on photomask inspectability

Evaluation of the impact of pattern fidelity on photomask inspectability

著者名:

Woolverton, K. S. ( Intel Corp. (USA) )
Liu, C. ( Intel Corp. (USA) )
Zwigl, P. ( Intel Corp. (USA) )
Ruch, W. ( KLA-Tencor Corp. (USA) )

掲載資料名:

Photomask and X-Ray Mask Technology VI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3748

発行年:

1999

開始ページ:

520

終了ページ:

527

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819432308 [081943230X]

言語:

英語

請求記号:

P63600/3748

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014623
シリーズID:	PA00000029
会議名:	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
回次:	1999 : 6th
会議開催地:	Yokohama, Japan
会議開催年:	1999.04.13-1999.04.14

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