Progress in SiC membrane for x-ray mask

Progress in SiC membrane for x-ray mask

著者名:

Shoki, T. ( HOYA Corp. (Japan) )
Kurikawa, A. ( HOYA Corp. (Japan) )
Kawahara, T. ( HOYA Corp. (Japan) )
Sakurai, T. ( HOYA Corp. (Japan) )

掲載資料名:

Photomask and X-Ray Mask Technology VI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3748

発行年:

1999

開始ページ:

456

終了ページ:

461

総ページ数:

6

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819432308 [081943230X]

言語:

英語

請求記号:

P63600/3748

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014623
シリーズID:	PA00000029
会議名:	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
回次:	1999 : 6th
会議開催地:	Yokohama, Japan
会議開催年:	1999.04.13-1999.04.14

類似資料:

1 国際会議録 PROPERTIES OF SiC FILM AS X-RAY MASK MEMBRANE Yamaguchi, Yoh-Ichi, Annaka, Norimichi, Shoki, Tsutomu, Ameniya, Isao, Nagasawa, Hiroyuki, Kosuga, Hiroyuki, Nagarekawa, … MRS - Materials Research Society	7 国際会議録 CAR blanks feasibility study results Yokoya,Y., Kobayashi,H., Higuchi,T., Asakawa,K., Kurikawa,A., Sakurai,T., Hashimoto,M., Ota,F. SPIE - The International Society for Optical Engineering
2 国際会議録 Amorphous stuctured Ta₄B absorber on SiC membrane for x-ray mask T. Shoki, R. Ohkubo, G.M. Wells, Y. Yamaguchi, K. Yamazaki Society of Photo-optical Instrumentation Engineers	8 国際会議録 Study on exposure contrast of an EUV mask Hosoya, M., Shoki, T., Kinoshita, T., Sakaya, N., Nagarekawa, O. SPIE-The International Society for Optical Engineering
3 国際会議録 Scattered-light alignment system using SiC mask for x-ray lithography Miyatake,T., Hirose,M., Shoki,T., Ohkubo,R., Yamazaki,K. SPIE-The International Society for Optical Engineering	9 国際会議録 EUVL mask substrate defect print study J. Cullins, Y. Tezuka, I. Nishiyama, T. Hashimoto, T. Shoki SPIE - The International Society of Optical Engineering
4 国際会議録 Characteristics of Ta4B/SiC x-ray mask blanks Ohkubo,R., Shoki,T., Mitsui,H., Annaka,N., Yamaguchi,Y. SPIE-The International Society for Optical Engineering	10 国際会議録 Recent performance of EUV mask blanks with low-thermal expansion glass substrates T. Shoki, T. Yamada, S. Shimojima, Y. Shiota, M. Tsukahara Society of Photo-optical Instrumentation Engineers
5 国際会議録 Study of SiC x-ray mask distortion induced by backetching receding subtractive fabrication process S. Tsuboi, T. Shoki, T. Ohta, H. Okuyama, K. Ashikaga Society of Photo-optical Instrumentation Engineers	11 国際会議録 Process development of 6-in EUV mask with TaBN absorber Shoki, T., Hosoya, M., Kinoshita, T., Kobayashi, H., Usui, Y., Ohkubo, R., Ishibashi, S., Nagarekawa, O. SPIE-The International Society for Optical Engineering
6 国際会議録 Study on x-ray irradiation stability of absorber materials for x-ray masks by stress measurement Ashikaga,K., Tsuboi,S., Yamashita,Y., Sugihara,S., Gomei,Y., Shoki,T., Yamaguchi,Y., Ohta,T. SPIE-The International Society for Optical Engineering	12 国際会議録 Identification of the Negative Carbon Vacancy at Quasi-Cubic Site in 4H-SiC by EPR and Theoretical Calculations X.T. Trinh, K. Szász, T. Hornos, K. Kawahara, J. Suda Trans Tech Publications

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