Development of Cr-based attenuated phase-shift mask process for 0.18-μm device generation

Development of Cr-based attenuated phase-shift mask process for 0.18-μm device generation

著者名:

Kagami, I. ( Sony Corp. (Japan) )
Ishikawa, K. ( Sony Corp. (Japan) )
Kakuta, D. ( Sony Corp. (Japan) )
Kawahira, H. ( Sony Corp. (Japan) )

掲載資料名:

Photomask and X-Ray Mask Technology VI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3748

発行年:

1999

開始ページ:

340

終了ページ:

349

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819432308 [081943230X]

言語:

英語

請求記号:

P63600/3748

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014623
シリーズID:	PA00000029
会議名:	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
回次:	1999 : 6th
会議開催地:	Yokohama, Japan
会議開催年:	1999.04.13-1999.04.14

類似資料:

1 国際会議録 Fabrication process of Cr-based attenuated phase-shift masks for KrF excimer laser Lithography Kagami,I., Ishikawa,K., Kakuta,D., Kawahira,H. SPIE - The International Society for Optical Engineering	7 国際会議録 Optimization of fabrication process for dual-trench-type alternating PSM Komizo,T., Kagami,I., Kakuta,D., Kawahira,H. SPIE-The International Society for Optical Engineering
2 国際会議録 Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity Sugawara,M., Ishikawa,K., Kawahira,H., Kagami,I., Nozawa,S. SPIE-The International Society for Optical Engineering	8 国際会議録 Quantitative evaluation of focused ion-beam repair for quartz bump defect of alternating phase-shift masks Kakuta,D., Kagami,I., Komizo,T., Ohnuma,H. SPIE-The International Society for Optical Engineering
3 国際会議録 Focused ion beam repair for quartz bump defect of alternating phase-shift masks Kagami,I., Kakuta,D., Komizo,T., Kawahira,H. SPIE-The International Society for Optical Engineering	9 国際会議録 Evaluation of phase-edge phase-shifting mask for sub-0.18-ｦﾌm gate patterns in logic devices Cha,D.-H., Kye,J.-W., Seong,N.-G., Kang,H.-Y., Cho,H.-K., Moon,J.-T. SPIE-The International Society for Optical Engineering
4 国際会議録 Attenuated phase-shifting mask specification with modified beam illumination Kagami,I., Sugawara,M., Kawahira,H., Tsudaka,K., Ishikawa,K., Nozawa,S. SPIE-The International Society for Optical Engineering	10 国際会議録 Optical proximity correction of alternating phase-shift masks for 0.18-ｦﾌm KrF lithography Yasuzato,T., Ishida,S., Shioiri,S., Tanabe,H., Kasama,K. SPIE-The International Society for Optical Engineering
5 国際会議録 Automatic alternative phase-shift mask CAD layout tool for gate shrinkage of ebedded DRAM in logic below 0.18 ｦﾌm Ohnuma,H., Kawahira,H. SPIE-The International Society for Optical Engineering	11 国際会議録 Issues on mask technologies:0.18-ｦﾌm and beyond Hayashi,N., Kawahira,H., Hamada,H. SPIE - The International Society for Optical Engineering
6 国際会議録 Application of attenuated phase-shift masks to sub-0.18-ｦﾌm logic patterns Fritze,M., Wyatt,P.W., Astolfi,D.K., Davis,P., Curtis,A.V., Preble,D.M., Cann,S.G., Denault,S., Chan,D., Shaw,J.C., … SPIE - The International Society for Optical Engineering	12 国際会議録 Mask technology for 0.18-ｦﾌm device generation Sohn,J.M., Choi,S.W., Kim,B.G., Cho,H.K., Yoon,H.S. SPIE-The International Society for Optical Engineering

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