Resolution enhancement with high-transmission attenuating phase-shift masks

Resolution enhancement with high-transmission attenuating phase-shift masks

著者名:

Socha, R. J. ( National Semiconductor Corp. (USA) )

Conley, W. E. ( National Semiconductor Corp. (USA) )

Shi, X. ( National Semiconductor Corp. (USA) )

Dusa, M. V. ( National Semiconductor Corp. (USA) )

Petersen, J. S. ( Petersen Advanced Lithography (USA) )

Chen, F. ( MicroUnity Systems Engineering, Inc. (USA) )

Wampler, K. E. ( MicroUnity Systems Engineering, Inc. (USA) )

Laidig, T. L. ( MicroUnity Systems Engineering, Inc. (USA) )

Caldwell, R. F. ( MicroUnity Systems Engineering, Inc. (USA) )

さらに 4 件

掲載資料名:

Photomask and X-Ray Mask Technology VI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3748

発行年:

1999

開始ページ:

290

終了ページ:

314

総ページ数:

25

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819432308 [081943230X]

言語:

英語

請求記号:

P63600/3748

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014623
シリーズID:	PA00000029
会議名:	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
回次:	1999 : 6th
会議開催地:	Yokohama, Japan
会議開催年:	1999.04.13-1999.04.14

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1 国際会議録 Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results Socha,R.J., Shi,X., Holman,K.C., Dusa,M.V., Conley,W., Petersen,J.S., Chen,J.F., Laidig,T.L., Wampler,K.E., … SPIE - The International Society for Optical Engineering	7 国際会議録 Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems Nakagawa, K. H., Chen, J. F., Socha, R. J., Laidig, T. L., Wampler, K. E., Van Den Broeke, D., Dusa, M. V., Caldwell, R. … SPIE - The International Society of Optical Engineering
2 国際会議録 Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I Socha,R.J., Petersen,J.S., Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F. SPIE - The International Society for Optical Engineering	8 国際会議録 Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL) Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., Hsu, S.D., Wampler, K.E., Socha, R.J., Petersen, J.S. SPIE-The International Society for Optical Engineering
3 国際会議録 Contact and via hole mask design optimization for 65-nm technology node Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. … SPIE - The International Society of Optical Engineering	9 国際会議録 Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond Hsu, S.D., Corcoran, N.P., Eurlings, M., Knose, W.T., Laidig, T.L., Wampler, K.E., Roy, S., Shi, X., Hsu, C.M., Chen, … SPIE-The International Society for Optical Engineering
4 国際会議録 Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask Chen, J.F., Van Den Broeke, D.J., Hsu, M., Laidig, T.L., Wampler, K.E., Shi, X., Hsu, S., Shafer, T. SPIE-The International Society for Optical Engineering	10 国際会議録 Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering
5 国際会議録 Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering	11 国際会議録 Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N.P., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering
6 国際会議録 Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering	12 国際会議録 Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography Petersen,J.S., Socha,R.J., Naderi,A.R., Baker,C.A., Rizvi,S.A., BanDenBroeke,D., Kachwala,N., Chen,F., Laiding,S., … SPIE-The International Society for Optical Engineering

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