ICP (inductively coupled plasma) dry etch of DUV MoSi HTPSM
- 著者名:
Lee, K. Y. ( DuPont Photomasks Korea Ltd. ) Kim, L. J. ( DuPont Photomasks Korea Ltd. ) Nam, K. -H. ( DuPont Photomasks Korea Ltd. ) Park, K. T. ( DuPont Photomasks Korea Ltd. ) Ku, Y. M. ( Hyundai Electronics (Korea) ) Ku, S. S. ( Hyundai Electronics (Korea) ) Hur, I. B. ( Hyundai Electronics (Korea) ) - 掲載資料名:
- Photomask and X-Ray Mask Technology VI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3748
- 発行年:
- 1999
- 開始ページ:
- 158
- 終了ページ:
- 165
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432308 [081943230X]
- 言語:
- 英語
- 請求記号:
- P63600/3748
- 資料種別:
- 国際会議録
類似資料:
MRS - Materials Research Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
SPIE - The International Society for Optical Engineering |
6
国際会議録
High Density Inductively Coupled Plasma Etching of Zinc-Oxide(ZnO) and Indium-Zinc Oxide(IZO)
Electrochemical Society |
SPIE-The International Society for Optical Engineering |