Properties of our developing next-generation photomask substrate (Invited Paper)
- 著者名:
- Takeuchi, M. ( Shin-Etsu Chemical Co., Ltd. (Japan) )
- Shibano, Y. ( Shin-Etsu Chemical Co., Ltd. (Japan) )
- Kusama, S. ( Shin-Etsu Chemical Co., Ltd. (Japan) )
- 掲載資料名:
- Photomask and X-Ray Mask Technology VI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3748
- 発行年:
- 1999
- 開始ページ:
- 41
- 終了ページ:
- 52
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432308 [081943230X]
- 言語:
- 英語
- 請求記号:
- P63600/3748
- 資料種別:
- 国際会議録
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