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Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography

著者名:
Lu, Z. G. ( Seimens Microelectronics )
Cui, Y. ( IBM Microelectronics Div. )
Thomas, A. C. ( IBM Microelectronics Div. )
Mansfield, S. M. ( IBM Microelectronics Div. )
Kunkel, G. ( Siemens Microelectronics )
Dobuzinsky, D. ( IBM Microelectronics Div. )
Zach, F. X. ( IBM Microelectronics Div. )
Liu, D. ( Siemens Microelectronics )
Chen, K. -J. R. ( IBM Microelectronics Div. )
Jordhamo, G. ( IBM Microelectronics Div. )
Cutmann, A. ( Siemens Microelectronics )
Farrell, T. R. ( IBM Microelectronics Div. )
さらに 7 件
掲載資料名:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3678
発行年:
1999
開始ページ:
923
終了ページ:
934
総ページ数:
12
出版情報:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
言語:
英語
請求記号:
P63600/3678-2
資料種別:
国際会議録

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