193-nm single-layer process for 150-nm technology generation and below
- 著者名:
Amblard, G. R. ( International SEMATECH and STMicroelectronics (France) ) Zandbergen, P. ( International SEMATECH and Philips Research Labs. (Netherlands) ) McCallum, M. ( International SEMATECH and Motorola ) Stephen, A. ( International SEMATECH and Advanced Micro Devices, Inc. ) Byers, J. D. ( International SEMATECH ) Dean, K. R. ( International SEMATECH ) Meute, J. ( International SEMATECH and IBM Corp. ) Nelson, C. M. ( International SEMATECH and Motorola ) - 掲載資料名:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3678
- 発行年:
- 1999
- 開始ページ:
- 810
- 終了ページ:
- 827
- 総ページ数:
- 18
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- 言語:
- 英語
- 請求記号:
- P63600/3678-2
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
国際会議録
193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |