Sub-0.25-μm i-line photoresist: the role of advanced resin technology
- 著者名:
- Xu, C. ( Shipley Co. Inc. )
- Zampini, A. ( Shipley Co. Inc. )
- Sandford, H. F. ( Shipley Co. Inc. )
- Lachowski, J. ( Shipley Co. Inc. )
- Carmody, J. ( Shipley Co. Inc. )
- 掲載資料名:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3678
- 発行年:
- 1999
- 開始ページ:
- 739
- 終了ページ:
- 750
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- 言語:
- 英語
- 請求記号:
- P63600/3678-2
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Parasitic Resistance Considerations of Using Elevated Source/Drain for Sub-0.25 μm MOSFET Technology
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
Materials Research Society |