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Design of acid labile protecting groups in chemically amplified resists

著者名:
Fujita, J. ( Mitsubishi Chemical Corp. (Japan) )
Sasaki, K. ( Mitsubishi Chemical Corp. (Japan) )
Kameyama, Y. ( Mitsubishi Chemical Corp. (Japan) )
Chika, Y. ( Mitsubishi Chemical Corp. (Japan) )
Kashiwagi, T. ( Mitsubishi Chemical Corp. (Japan) )
Niinomi, T. ( Mitsubishi Chemical Corp. (Japan) )
Tanaka, Y. ( Mitsubishi Chemical Corp. (Japan) )
Tarutani, S. ( Mitsubishi Chemical Corp. (Japan) )
Ochiai, T. ( Mitsubishi Chemical Corp. (Japan) )
さらに 4 件
掲載資料名:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3678
発行年:
1999
開始ページ:
608
終了ページ:
616
総ページ数:
9
出版情報:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
言語:
英語
請求記号:
P63600/3678-1
資料種別:
国際会議録

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