Toward the ultimate storage device: the fabrication of an ultrahigh-density memory device with 193-nm lithography

Toward the ultimate storage device: the fabrication of an ultrahigh-density memory device with 193-nm lithography

著者名:

Cirelli, R. A. ( Lucent Technologies/Bell Labs. )

Bude, J. ( Lucent Technologies/Bell Labs. )

Mansfield, W. M. ( Lucent Technologies/Bell Labs. )

Timp, G. L. ( Lucent Technologies/Bell Labs. )

Klemens, F. P. ( Lucent Technologies/Bell Labs. )

Watson, C. P. ( Lucent Technologies/Bell Labs. )

Weber, G. R. ( Lucent Technologies/Bell Labs. )

Sweeney, J R. ( Lucent Technologies/Bell Labs. )

Houlihan, F. M. ( Lucent Technologies/Bell Labs. )

Gabor, A. H. ( Olin Microelectronic Materials )

Baumann, F. ( Lucent Technologies/Bell Labs. )

Buonanno, M. ( Lucent Technologies/Bell Labs. )

Forsyth, G. F. ( Lucent Technologies/Bell Labs. )

Barr, D. ( Lucent Technologies/Bell Labs. )

Lee, T. C. ( Lucent Technologies/Bell Labs. )

Rafferty, C. S. ( Lucent Technologies/Bell Labs. )

Hutton, R. S. ( Lucent Technologies/Bell Labs. )

Timko, A. G. ( Lucent Technologies/Bell Labs. )

Hergenrother, J. ( Lucent Technologies/Bell Labs. )

Reichmanis, E. ( Lucent Technologies/Bell Labs. )

Harriott, L. R. ( Lucent Technologies/Bell Labs. )

Hillenius, S. J. ( Lucent Technologies/Bell Labs. )

Nalamasu, O. ( Lucent Technologies/Bell Labs. )

さらに 18 件

掲載資料名:

Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3678

発行年:

1999

開始ページ:

295

終了ページ:

305

総ページ数:

11

出版情報:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819431523 [0819431524]

言語:

英語

請求記号:

P63600/3678-1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014620
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Microlithography
回次:	1999 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.03.15-1999.03.17

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2 国際会議録 193 nm single layer resist based on poly(norbornene-alt-maleic anhydride) derivatives: the interplay of the chemical structure of components and lithographic … Houlihan, F.M., Timko, a., Hutton, R., Cirelli, R., Kometani, J.M., Reichmanis, Elsa, Nalamasu, O. American Chemical Society	8 国際会議録 Depth of focus enhancement for 193-nm window lithography with subresolution assist features Watson,G.P., Kroyan,A., Cirelli,R.A., G,P Klemens, Timp,L., Nalamasu,O., Maynard,Lucent H.L., Sweeney,J.R., … SPIE - The International Society for Optical Engineering
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