Electrical and Optical Characteristics of Isoelectronic Al-Doped GaN Films Grown by Metal Organic Chemical Vapor Deposition | 東京工業大学附属図書館文献データベース

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Electrical and Optical Characteristics of Isoelectronic Al-Doped GaN Films Grown by Metal Organic Chemical Vapor Deposition

著者名:

さらに 4 件

掲載資料名:

Materials and devices for optoelectronics and microphotonics : symposium held April 1-5, 2002, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

722

発行年:

2002

開始ページ:

109

終了ページ:

116

総ページ数:

8

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558996588 [1558996583]

言語:

英語

請求記号:

M23500/722

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014595
シリーズID:	PA00000011
会議名:	Symposium on materials and devices for optoelectronics and microphotonics
回次:	2002
会議開催地:	San Francisco, CA, USA
会議開催年:	2002.04.01-2002.04.05

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