Experimental study on the mechanism of carbon diffusion in silicon
- 著者名:
Cowern, N.E.B. Colombeau, B. Roozeboom, F. Hopstaken, M. Snijders, H. Meunier-Beillard, P. Lerch, W. - 掲載資料名:
- Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 717
- 発行年:
- 2002
- 開始ページ:
- 255
- 終了ページ:
- 262
- 総ページ数:
- 8
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996533 [1558996532]
- 言語:
- 英語
- 請求記号:
- M23500/717
- 資料種別:
- 国際会議録
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