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Modeling Of Diffusion And Activation Of Low Energy Arsenic Implants In Silicon

著者名:
掲載資料名:
Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
717
発行年:
2002
開始ページ:
129
終了ページ:
134
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558996533 [1558996532]
言語:
英語
請求記号:
M23500/717
資料種別:
国際会議録

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