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Diffusion Studies Of Cu In Si And Low-K Dielectric Materials

著者名:
Prasad, K.
Yuan, X.L.
Tan, C.M.
Zhang, D.H.
Li, C. Y.
Wang, S.R.
Yuan, S.Y.J.
Xie, J.L.
Gui, D.
Foo, P.D.
さらに 5 件
掲載資料名:
Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
716
発行年:
2002
開始ページ:
395
終了ページ:
400
総ページ数:
6
出版情報:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558996526 [1558996524]
言語:
英語
請求記号:
M23500/716
資料種別:
国際会議録

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