Residual Ion Implantation Damage at Source/Drain Junctions of Excimer Laser Annealed Polycrystalline Silicon Thin Film Transistor

Residual Ion Implantation Damage at Source/Drain Junctions of Excimer Laser Annealed Polycrystalline Silicon Thin Film Transistor

著者名:

掲載資料名:

Amorphous and heterogeneous silicon-based films - 2002 : symposium held April 2-5, 2002, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

715

発行年:

2002

開始ページ:

725

終了ページ:

730

総ページ数:

6

出版情報:

Warrendale: Materials Research Society

ISSN:

02729172

ISBN:

9781558996519 [1558996516]

言語:

英語

請求記号:

M23500/715

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014588
シリーズID:	PA00000011
会議名:	Symposium on amorphous and heterogeneous silicon-based films
回次:	2002
会議開催地:	San Francisco, CA, USA
会議開催年:	2002.04.02-2002.04.05

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