Gas Phase Chemistry Study During Deposition Of Amorphous And Microcrystalline Silicon Films By HWCVD Using Quadrupole Mass Spectrometry

Gas Phase Chemistry Study During Deposition Of Amorphous And Microcrystalline Silicon Films By HWCVD Using Quadrupole Mass Spectrometry

著者名:

掲載資料名:

Amorphous and heterogeneous silicon-based films - 2002 : symposium held April 2-5, 2002, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

715

発行年:

2002

開始ページ:

171

終了ページ:

178

総ページ数:

8

出版情報:

Warrendale: Materials Research Society

ISSN:

02729172

ISBN:

9781558996519 [1558996516]

言語:

英語

請求記号:

M23500/715

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014588
シリーズID:	PA00000011
会議名:	Symposium on amorphous and heterogeneous silicon-based films
回次:	2002
会議開催地:	San Francisco, CA, USA
会議開催年:	2002.04.02-2002.04.05

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