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Strain Relaxation of He+ Implanted, Pseudomorphic Si1-xGex Layers on Si(100)

著者名:
Hollander, B.
Mantl, S.
Lenk, St.
Trinkaus, H.
Kirch, D.
Luysberg, M.
Hackbarth, Th.
Herzog, H.-J.
Fichtner, P.F.P.
さらに 4 件
掲載資料名:
Current issues in heteroepitaxial growth--stress relaxation and self assembly : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
696
発行年:
2002
開始ページ:
75
終了ページ:
80
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558996328 [155899632X]
言語:
英語
請求記号:
M23500/696
資料種別:
国際会議録

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