Low Temperature Silicon Dioxide Thin Films Deposited Using Tetramethylsilane for Stress Control and Coverage Applications
- 著者名:
- 掲載資料名:
- Thin films : stresses and mechanical properties IX : symposium held November 26-30, 2001, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 695
- 発行年:
- 2002
- 開始ページ:
- 371
- 終了ページ:
- 376
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996311 [1558996311]
- 言語:
- 英語
- 請求記号:
- M23500/695
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Low-Temperature, High-Quality Silicon Dioxide Thin Films Deposited Using Tetramethylsilane (TMS)
MRS - Materials Research Society |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
MRS - Materials Research Society | |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Electrochemical Society |
Trans Tech Publications |
SPIE - The International Society of Optical Engineering |