Integration Processes and Properties of Pt/Pb5Ge3O11/(Zr, Hf)O2/Si One Transistor Memory Devices
- 著者名:
- 掲載資料名:
- Ferroelectric Thin Films X : symposium held November 25-29, 2001, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 688
- 発行年:
- 2002
- 開始ページ:
- 371
- 終了ページ:
- 376
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996243 [1558996249]
- 言語:
- 英語
- 請求記号:
- M23500/688
- 資料種別:
- 国際会議録
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10
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MFMOS capacitor with Pb5Ge3O11 thin film for one transistor ferroelectric memory applications
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