Charge Transport in Low Stress Si-rich Silicon Nitride Thin Films

Charge Transport in Low Stress Si-rich Silicon Nitride Thin Films

著者名:

掲載資料名:

Materials science of microelectromechanical systems (MEMS) devices IV : symposium held November 25-28, 2001, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

687

発行年:

2002

開始ページ:

107

終了ページ:

112

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558996236 [1558996230]

言語:

英語

請求記号:

M23500/687

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014563
シリーズID:	PA00000011
会議名:	Symposium on materials science of microelectromechanical systems (MEMS) devices
回次:	4th
会議開催地:	Boston, MA, USA
会議開催年:	2001.11.25-2001.11.28

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