A Self-Aligned Silicide Process for Thin Silicon-on-Insulator MOSFETs and Bulk MOSFETs With Shallow Junctions
- 著者名:
Cohen, G.M. Cabral, C., Jr. Lavoie, C. Solomon, P.M. Guarini, K.W. Chan, K.K. Roy, R.A. - 掲載資料名:
- Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 686
- 発行年:
- 2002
- 開始ページ:
- 89
- 終了ページ:
- 94
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996229 [1558996222]
- 言語:
- 英語
- 請求記号:
- M23500/686
- 資料種別:
- 国際会議録
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