Analysis of Copper to Tantalum Transition in Copper CMP
- 著者名:
- 掲載資料名:
- Chemical-mechanical polishing 2001 -- advances and future challenges : symposium held April 18-20, 2001, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 671
- 発行年:
- 2001
- 総ページ数:
- 6
- 出版情報:
- Warrendale, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996076 [1558996079]
- 言語:
- 英語
- 請求記号:
- M23500/671
- 資料種別:
- 国際会議録
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Materials Research Society |
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Materials Research Society |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
12
国際会議録
Feasibility of Detecting Barrier Layer to Low-K Transition in Copper CMP Using Raman Spectroscopy
Materials Research Society |