Influence of Arsenic Clustering and Precipitation on the Interstitial and Vacancy Concentration in Silicon
- 著者名:
Brindos, R. Clark, M.H. Jones, K.S. Griglione, M. Gossmann, Hans-J. Agarwal, A. Murto, B. Andideh, E. - 掲載資料名:
- Si front-end processing -- physics and technology of dopant-defect interactions III : symposium held April 17-19, 2001, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 669
- 発行年:
- 2001
- 総ページ数:
- 6
- 出版情報:
- Warrendale, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996052 [1558996052]
- 言語:
- 英語
- 請求記号:
- M23500/669
- 資料種別:
- 国際会議録
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