Etch Rate and Surface Morphology of Plasma Etched Glass Substrates

Etch Rate and Surface Morphology of Plasma Etched Glass Substrates

著者名:

掲載資料名:

Materials science of microelectromechanical systems (MEMS) devices III : symposium held November 27-28, 2000, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

657

発行年:

2001

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558995673 [1558995676]

言語:

英語

請求記号:

M23500/657

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014541
シリーズID:	PA00000011
会議名:	Symposium on materials science of microelectromechanical systems (MEMS) devices
回次:	3rd
会議開催地:	Boston, MA, USA
会議開催年:	2000.11.27-2000.11.28

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