Electrodes and Barriers for DRAM and FERAM: Processing, Integration, and Fundamentals
- 著者名:
Saenger, K.L. Andricacos, P.C. Athavale, S.D. Baniecki, J.D. Cabral, C., Jr. Costrini, G. Kwietniak, K.T. Laibowitz, R.B. Lian, J.J. Limb, Y. Neumayer, D.A. Wise, M.L. - 掲載資料名:
- Ferroelectric thin films IX : symposium held November 26-30, 2000, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 655
- 発行年:
- 2001
- 総ページ数:
- 11
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995659 [155899565X]
- 言語:
- 英語
- 請求記号:
- M23500/655
- 資料種別:
- 国際会議録
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