Optimization of the Ion-Cut Process in Si and SiC

Optimization of the Ion-Cut Process in Si and SiC

著者名:

掲載資料名:

Ion beam synthesis and processing of advanced materials : symposium held November 27-29, 2000, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

647

発行年:

2001

総ページ数:

10

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558995574 [1558995579]

言語:

英語

請求記号:

M23500/647

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014532
シリーズID:	PA00000011
会議名:	Symposium on ion beam synthesis and processing of advanced materials
回次:	2000
会議開催地:	Boston, MA, USA
会議開催年:	2000.11.27-2000.11.29

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