Effect of N2 Plasma Treatments on Dry Etch Damage in n- and p-type GaN | 東京工業大学附属図書館文献データベース

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Effect of N2 Plasma Treatments on Dry Etch Damage in n- and p-type GaN

著者名:

Abernathy, C. R.

Mackenzie, K. D.

さらに 5 件

掲載資料名:

GaN and related alloys - 2000 : symposium held November 27-December 1, 2000, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

639

発行年:

2001

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558995499 [1558995498]

言語:

英語

請求記号:

M23500/639

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014526
シリーズID:	PA00000011
会議名:	Symposium on gan and related alloys
回次:	2000
会議開催地:	Boston, MA, USA
会議開催年:	2000.11.27-2000.12.01

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