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High Resolution Resists for Next Generation Lithography: The Nanocomposite Approach

著者名:
掲載資料名:
Nonlithographic and lithographic methods of nanofabrication--from ultralarge-scale integration to photonics to molecular electronics : symposium held November 26-December 1, 2000, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
636
発行年:
2001
総ページ数:
12
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558995468 [1558995463]
言語:
英語
請求記号:
M23500/636
資料種別:
国際会議録

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