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Gate Oxide Integrity for Polysilicon Thin-Film Transistors: A Comparative Study for ELC, MILC, and SPC Crystallized Active Polysilicon Layer

著者名:
Choi, D.C.
Choi, B.D.
Jung, J.Y.
Park, H.H.
Seo, J.W.
Lee, K.Y.
Chung, H.K.
さらに 2 件
掲載資料名:
Amorphous and nanocrystalline silicon science and technology - 2005 : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
862
発行年:
2005
開始ページ:
647
終了ページ:
652
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558998155 [1558998152]
言語:
英語
請求記号:
M23500/862
資料種別:
国際会議録

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