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Application of Field-Enhanced Rapid Thermal Annealing to Activation of Doped Polycrystalline Si Thin Films

著者名:
So, B.S.
You, Y.H.
Kirn, H.J.
Kim, Y.H.
Hwang, J.H.
D.H. Shin,
Ryu, S.R.
Choi, K.
Kim, Y.C.
さらに 4 件
掲載資料名:
Amorphous and nanocrystalline silicon science and technology - 2005 : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
862
発行年:
2005
開始ページ:
275
終了ページ:
280
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558998155 [1558998152]
言語:
英語
請求記号:
M23500/862
資料種別:
国際会議録

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