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Influence of Hydrogen Plasma Treatment on He Implantation-Induced Nanocavities in Silicon

著者名:
Vengurlekar, A.
Ashok, S.
Liu, C.L.
Ntsoenzok, E.
Barthe, M.F.
Desgardin, P.
Ruault, M.O.
さらに 2 件
掲載資料名:
Radiation effects and ion-beam processing of materials : symposium held December 1-5, 2003, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
792
発行年:
2004
開始ページ:
183
終了ページ:
188
総ページ数:
6
出版情報:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781558997301 [155899730X]
言語:
英語
請求記号:
M23500/792
資料種別:
国際会議録

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