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Current Understanding and Modeling of B Diffusion and Activation Anomalies in Preamorphized Ultra-Shallow Junctions

著者名:
Colombeau, B.
Smith, A.J.
Cowern, N.E.B.
Pawlak, B.J.
Cristiano, F.
Duffy, R.
Claverie, A.
Ortiz, C.J.
Pichler, P.
Lampin, E.
Zechner, C.
さらに 6 件
掲載資料名:
Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
810
発行年:
2004
開始ページ:
91
終了ページ:
102
総ページ数:
12
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997608 [1558997601]
言語:
英語
請求記号:
M23500/810
資料種別:
国際会議録

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