Current Understanding and Modeling of B Diffusion and Activation Anomalies in Preamorphized Ultra-Shallow Junctions
- 著者名:
Colombeau, B. Smith, A.J. Cowern, N.E.B. Pawlak, B.J. Cristiano, F. Duffy, R. Claverie, A. Ortiz, C.J. Pichler, P. Lampin, E. Zechner, C. - 掲載資料名:
- Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 810
- 発行年:
- 2004
- 開始ページ:
- 91
- 終了ページ:
- 102
- 総ページ数:
- 12
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997608 [1558997601]
- 言語:
- 英語
- 請求記号:
- M23500/810
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society | |
Electrochemical Society |
Trans Tech Publications |