Atomically Controlled Impurity Doping in Si-Based CVD Epitaxial Growth
- 著者名:
- 掲載資料名:
- High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 809
- 発行年:
- 2004
- 開始ページ:
- 201
- 終了ページ:
- 212
- 総ページ数:
- 12
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997592 [1558997598]
- 言語:
- 英語
- 請求記号:
- M23500/809
- 資料種別:
- 国際会議録
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11
国際会議録
Low-Temperature Epitaxial Growth of In Situ Heavily B-Doped Si1-xGex Films Using Ultraclean LPCVD
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