Structuring of Silicon Wafer Surfaces on the Sub-100 nm Scale by Hydrogen Plasma Treatments

Structuring of Silicon Wafer Surfaces on the Sub-100 nm Scale by Hydrogen Plasma Treatments

著者名:

掲載資料名:

Continuous nanophase and nanostructured materials : symposium held December 1-5, 2003, Boston, Masachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

788

発行年:

2004

開始ページ:

571

終了ページ:

576

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558997264 [1558997261]

言語:

英語

請求記号:

M23500/788

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014445
シリーズID:	PA00000011
会議名:	Symposium on continuous nanophase and nanostructured materials
回次:	2003
会議開催地:	Boston, MA, USA
会議開催年:	2003.12.01-2003.12.05

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2 国際会議録 Bulk and Surface Properties of Cz Silicon After Hydrogen Plasma Treatments Job,R., Ulyashin,A.G., Fahrner,W.R., Markevich,V.P., Murin,L.I., Lindstrom,J.L., Raiko,V., Engemann,J. Electrochemical Society, SPIE-The International Society for Optical Engineering	8 国際会議録 On the Formation Kinetics of Thin Nanopatterned Layers on Silicon Wafers Created by Hydrogen Plasma Exposure Job, R., Huang, Y. L., Ma, Y., Zolgert, B., Dungen, W. Materials Research Society
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