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Characterization and Modeling of Wafer and Die Level Uniformity in Deep Reactive Ion Etching (DRIE)

著者名:
掲載資料名:
Micro- and nanosystems : symposium held December 1-3, 2003, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
782
発行年:
2004
開始ページ:
435
終了ページ:
440
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997202 [1558997202]
言語:
英語
請求記号:
M23500/782
資料種別:
国際会議録

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